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SMORGON OPTICAL MACHINE-TOOL FACTORY

( VACUUM TECHIQUE)

VACUUM INSTALLATIONS

MODEL BY -1A Vacuum installation

The installation is designed for coating optical parts by resistive and electron-beam evaporation of dielectrics, semiconductor materials and metals, with simultaneous coating thickness monitoring.

The installation provides for applying multilayer achromatic coatings over quantity-production parts, as well as metall, single-layer antireflection, interferential reflecctive, filtering and other coatings for various spectral regions.

The installation is intended for use in closed dry premiss of category 2 as per GOST 15150-69 in the below environment:

-ambient temperature: 17 to 27 grad C;

-relative air humidity: 40 to 75%;

- atmosphric pressure: 8,4x10 000 to 10,6x 10 000 Pa (630 to 780 mm Hg).

The installation includes the following components:

- exhaust unit (with high-vacuum exhaust facilities, vacuum system, pneumatic and hydraulic equipment);

- forevacuum unit;

- electrical equipment (mith two control racs, one for vacuum system,the other for process supply sources).

SPECIFICATIONS

1. In-chamber pressure, with simultaneous chamber

heating to 320 grad C (diffusion pump heated) and

traps cooling with liquid nitrogen, Pa ..........................4x10-4

2. Time to 4x10-4 Pa pressure, min, maximum ......................40

3. Chamber heating temperature, grad C ...................100 to 320

4. Number of resistive evaporation, pc ....................................2

5. Number of electroon-beam evaporators, pc .........................1

6. Workpice holding capacity, pc:

40 mm dia..................................70

70 mm dia....................................6

7. Ion cleaning glow discharge power supply......2175+/-20% to

voltageat no-load, V .................................................4350+/-20%

8. Maximum ion cleaning glow discharge current,A .............0,4

9. Maximum admissible current of resistive

evaporator, A, for transformer voltages of

12 V ........................................300

24 V ........................................150

10. Maximum current of electron beam

evaporator, mA..............................................................480+/-20

11. Power consumption, Kw, maximum .................................20

12.Mass, Kg, maximum ......................................................2600

13. Floor area, M2, maximum ...................................................6

MODEL BY - 1AM VACUUM PLANT

The By - 1AM vacuum plant is a modification of the BY -1A plant with ion low-power assing source "AIDA" which is intended to apply coatings of semiconductor materials and metals on optical parts, using the method of resistive and electron-beam evaporation of dielectric with a simultaneous control of the coating thickness.The "AIDA" source included in the plant is designed for the low-power assisting and ion-beam clearing of optical microelectronic parts.

Components:

- pumping-out post (with high-vacuum pumping-out means) on basis of the H400/7000 diffusion pump;

- forevacuum unit ABP-60;

- control rack;

- power supply unit;

- chamber;

- power supply unit for the "AIDA" source;

- ion source "AIDA".

SPECIFICATIOS

1. Pressure in the chamber, Pa .......................................4x10-4

2. Time to develop pressure with simultaneous

heating of the working volume of the chamber

up to 320 grad C at the heated diffusion pump

and at the cooling of traps with liquid nitrogen,

minutes, max .........................................................................40

3. Number of resistive evaporators, pc ....................................2

4. Number of electron-beam evaporators pc ............................1

5. Power consumed by the vacuum plant, kW........................20

6. Area occupied by the plant, m2 ...........................................6

7. Plant Weight, kg .............................................................1750

8. Output (at the 40 mm dia.), pc./cycle .................................50

9. Low-power ion source "AIDA":

- discharge current, A .................................4

- average anod voltage at dischage, V .....170

- power consumption, kW ...........................2

-ion current, A ......................................... 0,8

- ion beam aperture ...................................90

-overall dimensions:

diameter, mm ....................................140

height, mm.........................................212

The use of the assisting ion source "AIDA" in the technological process enables:

1. To process the substrate in the course of surface preporation bythe beam with wide aperture and ion energy up to 200 eV.

The ion processing prevents heating substrates and activates oxygen bonds of substrtates from organic materials.

Effects:

- the increase of efficiency preventing the substrate heating by the the termal method;

- good adhesive strength of the coating;

- posibillity of applicatiom of coating on thermoplastic materials.

2. To process the surface in the cource of coating deposition by the ion beam whose energy is 40-150 eV and ion current density is up to 2 mA/cm2.

The ion support (assisting) in the cource of coating deposition promotes the formation of nucleation centers of the film and consolidation of its structure.

Effects:

- the decrease of number and size of pores in the coating;

- fine grain structure of the film;

- formation of a high-quality coating at a temperature above 80 grad C.

MODEL BY-1ÁC VACUUM PLANT

The plant is designed to deposit thin-film wear-resistant and decorativecoating by high-melting conducting materials, such as titanium, zicorium, molybdenium, tantalum, vanadium and tangsten as well as by their gas compounds, such as nitrides and carbides on the items made of plastic, glass and ceramics, , on small-size instruments, elements of power electronics and consumer goods.

The plant consists of the following units:

- vacuum station;

- forevacuum unit;

- pyrometric temperature indicator;

- control stand;

- chamber with two evaporators attached and with a jammed opening for attaching the third evaporator.

Different modifications of vacuum plants are produced (BY-1ÁC-01 through BY-1ÁC-05) and depending upon customer's requirements and wishes they can be equipped additionally with the following assemblies:

- spectral control devices;

- ion accelerators "PULSAR-1";

- magnetron sources.

SPECIFICATIONS

1. Chamber pressure, Pa ................................................2x10-3

2. Time needed for achieving chamber pressure in

the operating regime of diffusion pump with the

cooling of water trap and with turntable device, min,

not more then ........................................................................15

3. Number of evaporators, pieces ...........................................2

4. Maximum plant power input, kW........................................25

5. Working chamber diameter, mm .....................................600